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sputtering ion pump type selection
08-21-2020, 10:19 AM,
Post: #1
sputtering ion pump type selection
sputtering ion pump type selection

When the inert gases such as argon, krypton and xenon are eliminated by the two-stage sputtering ion pump, the argon pressure will rise and then decrease suddenly in the vacuum system, and the pressure change range is 10-2 PA. This phenomenon is called argon instability. The instability of argon in two-stage ion pump after exhausting for hundreds of hours at 10-3pa or thousands of hours at 10-4Pa is given. In order to overcome this phenomenon, several improved structures of various improved sputtered ion pumps have been developed

The structure of bipolar pump is simple, the magnetic gap of magnet is small, but the starting pressure is low. If it is not started under high pressure and there is no special requirement for inert gas pumping speed, it is better to choose this kind of pump.

If high starting pressure is required, tripole structure or other auxiliary methods can be used. The process of triode structure is complex. If it is tripotential, the power supply is also complex. The magnetic gap of the magnet is also large.

Water Ring Vacuum Pump

Rotary Vane Vacuum Pump

2BV series Liquid ring vacuum pump

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